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Cosmetic Compositions Containing Phenolic Compounds
专利权人:
Sawa Hashimoto;Nghi Van Nguyeni
发明人:
Nghi Van Nguyeni,Sawa Hashimoto
申请号:
US13702993
公开号:
US20130149264A1
申请日:
2011.06.07
申请国别(地区):
US
年份:
2013
代理人:
摘要:
A method of photoprotecting a keratinous substrate comprising applying a composition onto the keratinous substrate, the composition comprising at least one phenolic compound chosen environmental at least one ortho-diphenol, at least one phenolic compound having a carboxylic acid moiety, and mixtures thereof, —a compound chosen from at least one pelyarn!ne, at least one water solvable metal salt, and mixtures thereof; and a cosmetically acceptable carrier. The present disclosure also relates to photoprotective compositions for application onto hair and skin, the compositions comprising at least one phenolic compound chosen from at least one ortho-diphenol, at least one phenolic compound having a carboxylic acid moiety, and mixtures thereof; a compound chosen from at least one polyamine, at least one water soluble metal salt, and mixtures thereof; and a cosmetically acceptable carrier.
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