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LOW-PROFILE ACCESS PORT
专利权人:
发明人:
申请号:
EP14743846.9
公开号:
EP2948121A1
申请日:
2014.01.23
申请国别(地区):
EP
年份:
2015
代理人:
摘要:
A low-profile access port for subcutaneous implantation within the body of a patient is disclosed. The access port includes a receiving cup that provides a relatively large subcutaneous target to enable a catheter-bearing needle to access the port without difficulty. In addition, the access port includes a valve/seal assembly to permit pressurized fluid injection through the port while preventing backflow. In one embodiment, therefore, a low-profile access port comprises a body including a conduit with an inlet port at a proximal end thereof, and a receiving cup. The receiving cup is concavely shaped to direct a catheter-bearing needle into the conduit via the inlet port. The receiving cup is oriented substantially toward a skin surface when subcutaneously implanted within the patient to ease needle impingement thereon. A valve/seal assembly disposed in the conduit enables passage of the catheter therethrough while preventing fluid backflow.
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中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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