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SOURCE A PLASMA ET APPLICATIONS CONNEXES
专利权人:
MCGILL UNIVERSITY
发明人:
COULOMBE, SYLVAIN,YONSON, SARA,LEVEILLE, VALERIE,LEASK, RICHARD
申请号:
CA2547043
公开号:
CA2547043C
申请日:
2006.05.16
申请国别(地区):
CA
年份:
2014
代理人:
摘要:
A low-power atmospheric pressure plasma source, comprising aplasma-forming region for injection of a plasma-forming gas; an excitationregion forinjection of a source of reactive species downstream of the plasma-formingregion;and a narrow converging plasma exit for producing a narrow plasma jet, thesourcebeing electrically decoupled from a substrate under treatment by the plasmajet. Thepresent source may find applications for example for skin treatment, etchingof skincancer cells, detachment of cells, removal of skin pigmentation and depositionoftemporary organic films.
来源网站:
中国工程科技知识中心
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