Terrence S. McGrath;Deidre Sewell;Daniel M. Storey
发明人:
Terrence S. McGrath,Deidre Sewell,Daniel M. Storey
申请号：
US11542531
公开号：
US08623446B2
申请日:
2006.10.03
申请国别(地区):
US
年份:
2014
代理人:
摘要：
The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.
