Disclosed herein is an RF treatment apparatus and a method of controlling the same, and an RF treatment apparatus, further comprising an RF generator for generating RF pulses for treatment having a predetermined energy a plurality of times； a monitoring unit for monitoring information on tissue state by each of the RF pulses； and a control unit for controlling RF pulse parameters by monitoring the information on state detected by the monitoring unit and a method of controlling the same are provided. The present invention enables an optimal treatment by identifying the characteristics of the tissue at a site for treatment followed by transmitting an appropriate RF pulse thereto.
