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ビーム監視システムおよび粒子線照射システム
专利权人:
株式会社日立製作所
发明人:
堀 能士,松下 尊良,森山 國夫,田所 昌宏
申请号:
JP2013248881
公开号:
JP6174983B2
申请日:
2013.12.02
申请国别(地区):
JP
年份:
2017
代理人:
摘要:
A beam monitor system having a simple configuration for improving a measurement precision specifying a position and the width. A beam monitor system, comprising collection electrodes that include a plurality of groups each having a plurality of adj acent wire electrodes, and detect an ionized particle beam passing therethrough, a first signal processing device that sets one wire electrode in the groups of the collection electrodes as a typical wire electrode, receives a detection signal output from the typical wire electrode to process the signal and a beam monitor controller (8b) that obtains a beam position of the ionized particle beam that has passed through the wire electrodes on the basis of a processed signal from the first signal processing device.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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