The resist removal rate and cleaning ability of conventional ozone water are still not enough to meet the requirements of the semiconductor production field of the present day, and conventional ozone water does not fully live up to expectations of further improvements in sterilization, bacterial eradication, air freshening, deodorization, and cleaning effects in the fields of cleaning of food materials, cleaning of processing equipment and instruments, cleaning of hands and fingers, etc., and in the fields of air freshening, deodorization, bacterial eradication, maintenance of freshness of food materials, etc. The problem can be solved by limiting the values of a plurality of particular manufacture parameters in manufacture of ozone water to specific ranges.本發明之課題在於：以往的臭氧水，係在現今的半導體之製造領域所要求的阻劑之去除速度、洗淨力尚未充分，於食材的洗淨、加工設備、器具的洗淨、手指的洗淨等領域，進而消臭、脫臭、除菌、食材的鮮度保持等領域中，亦不能充分回應殺菌、除菌、消臭、脫臭、洗淨效果的進一步提高之期待。上述課題係可藉由將臭氧水之製造中的特定之複數的製造參數之值規定在特定範圍而解決。
