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COMPOSITION PHOTOSENSIBLE ANTIMICROBIENNE ET PROCEDE
专利权人:
TOEFX INC.
发明人:
VAN-HAM, IRIT ITZHAKI
申请号:
CA3067761
公开号:
CA3067761A1
申请日:
2019.03.12
申请国别(地区):
CA
年份:
2019
代理人:
摘要:
An antimicrobial photosensitive composition for treating dermatologicalinfections comprising an inula viscosa extractand a pharmaceutically acceptable vehicle. The inula viscosa extract acts as anaturally-derived antimicrobial and a photosensitizer,and is capable of treating antimicrobial infections in combination withphotodynamic therapy. The present composition can be usedfor treating onychomycosis. Also described is a photodynamic method fortreating a microbial infection comprising applying aphoto-sensitizer composition to a site of microbial infection and exposing thesite of microbial infection to light having a wavelength in thewaveband of absorption of the photosensitizer.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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