Joseph M. DeSimone,Jason P. Rolland,Benjamin W. Maynor,Larken E. Euliss,Ginger Denison Rothrock,Ansley E. Dennis,Edward T. Samulski,R. Jude Samulski
申请号：
US14658386
公开号：
US09877920B2
申请日:
2015.03.16
申请国别(地区):
US
年份:
2018
代理人:
摘要：
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
