Thermal acid generators and photoresist pattern trimming compositions and methods

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专利权人:

Rohm and Haas Electronic Materials LLC

发明人:

Kaur Irvinder,Liu Cong,Rowell Kevin,Pohlers Gerhard,Li Mingqi

申请号：

US201615297556

公开号：

US10007179(B2)

申请日:

2016.10.19

申请国别(地区):

美国

年份:

2018

代理人:

Baskin Jonathan D.

摘要：

Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/