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AROMATIC RESINS FOR UNDERLAYERS
- 专利权人:
- Rohm and Haas Electronic Materials LLC
- 发明人:
- Liu Sheng,Yamada Shintaro,Cameron James F.,Cui Li,Coley Suzanne M.,Kaitz Joshua A.,Zhang Keren
- 申请号：
- US201715802094
- 公开号：
- US2018157175(A1)
- 申请日:
- 2017.11.02
- 申请国别(地区):
- 美国
- 年份:
- 2018
- 代理人:
- 摘要：
- Polyarylene resins and compositions containing them are useful as underlayers in semiconductor manufacturing processes.
- 来源网站：
- 中国工程科技知识中心
- 来源网址：
- http://www.ckcest.cn/home/
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