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METHOD FOR APPLYING CHARGED PARTICLES TO AN IMPLANT
专利权人:
发明人:
Helmut D. LINK
申请号:
US15128497
公开号:
US20180169299A1
申请日:
2015.03.25
申请国别(地区):
US
年份:
2018
代理人:
摘要:
The invention relates to a method for coating an implant (1), in particular a prosthesis, by applying charged particles (T) by means of iontophoresis to at least one section (10, 20 110, 120) of the implant surface (3, 13). In the method, charged particles are accelerated in an electromagnetic field (E) and hit the surface (3, 13) of the implant in order to form a coating on the implant at least in some sections. The charged particles have at least one active ingredient.
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