Suresh Srivastava,Gilbert R. Gonzales,Roger W. Howell,Wesley E. Bolch,Radoslav Adzic
申请号：
US11758937
公开号：
US08834338B2
申请日:
2007.06.06
申请国别(地区):
US
年份:
2014
代理人:
摘要：
The present invention discloses a method of selectively providing radiation dosimetry to a subject in need of such treatment. The radiation is applied by an implant comprising a body member and 117mSn electroplated at selected locations of the body member, emitting conversion electrons absorbed immediately adjacent selected locations while not affecting surrounding tissue outside of the immediately adjacent area.
