Maria Pettersson,Håkan Engqvist,Johanna André,Lars Hultman
申请号：
US15183080
公开号：
US20160354517A1
申请日:
2016.06.15
申请国别(地区):
US
年份:
2016
代理人:
摘要：
An implant comprises a substrate and a coating on a surface of the substrate, and the coating comprises silicon nitride and has a thickness of from about 1 to about 15 micrometer. A method of providing the implant comprises coating a surface of the implant substrate with the coating comprising silicon nitride and having a thickness of from about 1 to about 15 micrometer by physical vapour deposition.
