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眼科装置
专利权人:
株式会社ニデック
发明人:
迎 秀雄
申请号:
JP2010148160
公开号:
JP5654271B2
申请日:
2010.06.29
申请国别(地区):
JP
年份:
2015
代理人:
摘要:
PROBLEM TO BE SOLVED: To suitably make aberration measurements on the peripheral portion of an eye, regarding an ophthalmologic device having a measuring optical system for measuring the wavefront aberration of a subjects eye.SOLUTION: The ophthalmologic device includes: a wavefront aberration detection optical system for projecting measuring light toward the fundus oculi of the subjects eye, and receiving the reflected light by means of a wavefront sensor an irradiation position changer for changing the irradiation position of a measuring light beam on the fundus oculi and a controller for controlling the wavefront aberration detection optical system in order to correspond to a change in the irradiator caused by the irradiation position changer, and for controlling the brightness level of the reflected light in a detection signal outputted from the wavefront sensor. The wavefront aberration of the subjects eye is measured on the basis of the detection signal from the wavefront sensor.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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