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WAFER INSPECTION APPARATUS
专利权人:
KOREA BASIC SCIENCE INSTITUTE ;KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人:
Park Seung-young,Kim Sang-il,Jo Younghun,Min Byoung-Chul
申请号:
US201815974111
公开号:
US2018364181(A1)
申请日:
2018.05.08
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
Disclosed is a wafer inspection apparatus. The wafer inspection apparatus includes: a magnetic field generating unit forming a magnetic field such that magnetic lines of force flow in a direction perpendicular or parallel to a first surface of a wafer on which a magnetic thin film is formed; a microwave guide unit emitting microwaves to a measurement region that is at least a partial region of the wafer and is a region affected by the magnetic field generated by the magnetic field generating unit; and a sensing unit receiving waves reflected or transmitted after the microwaves are emitted to the measurement region from the microwave guide unit.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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