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Mixture of amides and cosmetic compositions comprising said mixture
专利权人:
Jürgen Benade
发明人:
Jürgen Benade,Reinout Van Der Veen,Neus Subirats Vicient,Pilar Castán Barberán
申请号:
US13141931
公开号:
US08246697B2
申请日:
2009.12.23
申请国别(地区):
US
年份:
2012
代理人:
摘要:
A mixture of amides of the following formula (I) is disclosed wherein —R1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms —R2 and R3 represent independently, a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms which is optionally hydroxylated, provided that R2 and R3 are not a hydrogen atom at the same time -n has a value in the range of 0.2 to lower than 3 characterized in that said mixture comprises: -amides (a) of formula (I) wherein R represents a C6-C24 alkyl or alkenyl group having even number of carbon atoms and at least a 95 wt. % of linearity and -amides (b) of formula (I) wherein R represents a C5-C23 alkyl or alkenyl group having odd or odd and even number of carbon atoms and a 35-85 wt. % of linearity and cosmetic compositions comprising said mixture, particularly dying compositions.
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