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Reduced-pressure wound dressings and systems for re-epithelialization and granulation
专利权人:
KCI Licensing; Inc.
发明人:
Christopher Brian Locke,Timothy Mark Robinson,Richard Daniel John Coulthard
申请号:
US14135120
公开号:
US10064759B2
申请日:
2013.12.19
申请国别(地区):
US
年份:
2018
代理人:
摘要:
Methods for promoting re-epithelialization and granulation as an aspect of wound healing are presented. A method for promoting granulation and re-epithelialization of a wound at the same time involves using a reduced-pressure treatment dressing and applying a moist, water-sensitive barrier to promote re-epithelialization and to inhibit granulation. Other methods are also presented.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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