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Fine metal structure, process for producing the same, fine metal mold and device
专利权人:
Hiroshi Yoshida
发明人:
Hiroshi Yoshida,Haruo Akahoshi,Akihiro Miyauchi,Masahiko Ogino
申请号:
US12859802
公开号:
US08741380B2
申请日:
2010.08.20
申请国别(地区):
US
年份:
2014
代理人:
摘要:
A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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