歯科用組成物、およびその製造方法

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专利权人:

株式会社トクヤマデンタル

发明人:

岸 裕人,沖汐 和彦,佐藤 猛,平田 広一郎

申请号：

JP2013054620

公开号：

JP6099443B2

申请日:

2013.03.18

申请国别(地区):

JP

年份:

2017

代理人:

摘要：

PROBLEM TO BE SOLVED: To provide a dental composition with suppressed sedimentation of fumed silica, excellent applicability, high adhesive strength of a cured body and excellent durability thereof.SOLUTION: In a dental composition comprising a polymerizable monomer, a fumed silica and a solvent, the average primary particle diameter of the fumed silica is 1 to 20 nm, the median diameter of the agglomerated secondary particle diameter of the fumed silica as measured by the laser diffraction scattering method is 50 to 500 nm, and the ratio of the fumed silica having an agglomerated secondary particle diameter of 50 to 500 nm is 90 vol.% or more.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/