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Hypochlorite denture compositions and methods of use
专利权人:
The Clorox Company
发明人:
Rumberger, Evan M.,Smith, William L.
申请号:
AU2010322318
公开号:
AU2010322318B2
申请日:
2010.10.14
申请国别(地区):
AU
年份:
2016
代理人:
摘要:
A solid composition including calcium and/or magnesium hypochlorite, a builder (e.g., one or more of carbonate, bicarbonate, sesquicarbonate), an acid, a water- soluble polymer, at least one anionic surfactant, and optionally, a hydrotrope. The composition does not include any potassium hypochlorite, sodium hypochlorite, lithium hypochlorite, N-halogenated compounds, peroxides, persulfates, hydantoins, isocyanurates, or carboxylic acids that also have hydroxyl, amino, amido, imino, or imido groups. Upon dissolution of the composition in water, the calcium and/or magnesium hypochlorite and acid react to form hypochlorous acid. The use of hypochlorous acid, rather than direct use of an alkaline or alkaline earth hypochlorite results in a composition that is typically acidic rather than basic, and that results in improved cleaning. The composition is particularly suited for cleaning and disinfecting dentures.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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