Heckroth Heike,Nefzger Hartmut,Wamprecht Christian
申请号:
SI200932042
公开号:
SI3097929T1
申请日:
2009.02.17
申请国别(地区):
SI
年份:
2020
代理人:
摘要:
Polyurea system comprises: (a) an amino functional aspartic acid (I); (b) an isocyanate functional prepolymer, with a residual monomer content of less than 1 wt.%, obtained by reacting (b1) aliphatic isocyanate with (b2) a polyol component with a number average molecular weight of greater than 400 g/mol and an average hydroxyl-functionality of 2-6 and comprises polyesterpolyol and/or polyester-polyether-polyol and optionally polyetherpolyol; and/or (c) optionally organic filler; and (d) optionally the reaction product of component (b) with component (a) and/or component (c). Polyurea-system comprises: (a) an amino functional aspartic acid of formula (X[-NH-CH(-CH 2-COOR 2)-COOR 1] n) (I); and (b) an isocyanate functional prepolymer, with residual monomer content of less than 1 wt.%, obtained by reacting (b1) aliphatic isocyanate with (b2) a polyol component with a number average molecular weight of greater than 400 g/mol and an average hydroxyl-functionality of 2-6 and comprises polyesterpolyol and/or polyester-polyether-polyol and optionally polyetherpolyol; and/or (c) optionally organic filler having viscosity, measured according to DIN 53019 at 23[deg] C, of 10-6000 mPas; and (d) optionally the reaction product of component (b) with component (a) and/or component (c). X : n-valenced organic residue, obtained by removing the primary amino group of n-valenced amine; R 1, R 2organic residue comprising no Zerewitinoff-active hydrogen; and n : whole number of at least 2. Independent claims are included for: (1) preparing the polyurea system, comprising mixing the components (a), (b), and optionally (c) and (d), where the ratio of free or blocked amino groups to free isocyanate groups is 1:1 and the weight ratio of the component (c) to component (a) is 0:1-20:1; and (2) a 2-chamber dosing system comprising the polyurea system, where one chamber comprises the component (a) and the other chamber comprises the harder component (b) and optional components (c) and (d).