Heckroth Heike,Nefzger Hartmut,Wamprecht Christian
申请号：
SI200932042
公开号：
SI3097929T1
申请日:
2009.02.17
申请国别(地区):
SI
年份:
2020
代理人:
摘要：
Polyurea system comprises: (a) an amino functional aspartic acid (I)； (b) an isocyanate functional prepolymer, with a residual monomer content of less than 1 wt.%, obtained by reacting (b1) aliphatic isocyanate with (b2) a polyol component with a number average molecular weight of greater than 400 g/mol and an average hydroxyl-functionality of 2-6 and comprises polyesterpolyol and/or polyester-polyether-polyol and optionally polyetherpolyol； and/or (c) optionally organic filler； and (d) optionally the reaction product of component (b) with component (a) and/or component (c). Polyurea-system comprises: (a) an amino functional aspartic acid of formula (X[-NH-CH(-CH 2-COOR 2)-COOR 1] n) (I)； and (b) an isocyanate functional prepolymer, with residual monomer content of less than 1 wt.%, obtained by reacting (b1) aliphatic isocyanate with (b2) a polyol component with a number average molecular weight of greater than 400 g/mol and an average hydroxyl-functionality of 2-6 and comprises polyesterpolyol and/or polyester-polyether-polyol and optionally polyetherpolyol； and/or (c) optionally organic filler having viscosity, measured according to DIN 53019 at 23[deg] C, of 10-6000 mPas； and (d) optionally the reaction product of component (b) with component (a) and/or component (c). X : n-valenced organic residue, obtained by removing the primary amino group of n-valenced amine； R 1, R 2organic residue comprising no Zerewitinoff-active hydrogen； and n : whole number of at least 2. Independent claims are included for: (1) preparing the polyurea system, comprising mixing the components (a), (b), and optionally (c) and (d), where the ratio of free or blocked amino groups to free isocyanate groups is 1:1 and the weight ratio of the component (c) to component (a) is 0:1-20:1； and (2) a 2-chamber dosing system comprising the polyurea system, where one chamber comprises the component (a) and the other chamber comprises the harder component (b) and optional components (c) and (d).
