Imidazopyrroloquinoline salt, method for producing the same, medicament, cosmetic, and food

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专利权人:

Mitsubishi Gas Chemical Company; Inc.

发明人:

Kazuto Ikemoto

申请号：

US15845112

公开号：

US10100055B2

申请日:

2017.12.18

申请国别(地区):

US

年份:

2018

代理人:

摘要：

There is provided a production method for the purpose of improving the solubility of an arginine-residue imidazopyrroloquinoline in water and making the purity thereof high. There is provided a compound represented by general formula (1):wherein n is 1, 2, 3 or 4； and M is an alkali metal or ammonium.

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