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Process to design and fabricate a custom-fit implant
专利权人:
Selvanathan Narainasamy
发明人:
Selvanathan Narainasamy,Victor S Devadass,Mangalam Sankupellay,Thyaganathan Seperamaniam,Somasundaram Nagappan,Senthil K Selvanathan,Nanchappan Selvanathan
申请号:
US12747075
公开号:
US08706285B2
申请日:
2008.12.11
申请国别(地区):
US
年份:
2014
代理人:
摘要:
A process for designing and fabricating a custom-fit implant, comprising: a) processing medical image data of a patients pathologically defective or anatomically deformed area having a symmetrical part to construct a three-dimensional (3D) digital model b) forming a mirror image of the left or right side of the three-dimensional (3D) digital model based on its axis of symmetry depending on which side the pathologically defective or anatomically deformed area is c) overlying the mirror image on the original image to form a composite image with a non-overlapping area wherein the implant will be fitted d) generating a digital implant by cutting off the non-overlapping area of the mirror image e) designing mounting points between the digital implant and the pathologically defective or anatomically deformed area where the implant is mounted thereon f) building a positive and a negative mold based on the digital implant to fabricate a custom-fit implant.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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