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EMC control for pulsed high voltage source of a plasma device for medical treatment
专利权人:
PLASMACURE B.V.
发明人:
DOUWE HENRIK DE VRIES,PAULIEN SMITS,WOUTER BASTIAAN ZEPER
申请号:
NL2020126
公开号:
NL2020126B1
申请日:
2017.12.19
申请国别(地区):
NL
年份:
2019
代理人:
摘要:
The invention relates to a high voltage source to be coupled to an electrode arrangement for a dielectric barrier discharge plasma treatment. It has a high voltage transformer device including a primary and secondary inductor coupled via a magnetic circuit. A feed circuit including a power capacitor, the power capacitor coupled with the primary inductor and a first controllable conductor in series. A controller is arranged to intermittent switching of the first controllable conductor in on- and off-states; and a second controllable conductor is coupled in parallel to the primary windings; the controller arranged to switch the second controllable conductor to a conducting on-state when the first controllable conductor is in an on-state to short the resonating current in the primary inductor
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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