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Serial irradiation of a substrate by multiple radiation sources
专利权人:
发明人:
Brent A. Anderson,Edward J. Nowak
申请号:
US13658861
公开号:
US08624204B2
申请日:
2012.10.24
申请国别(地区):
US
年份:
2014
代理人:
摘要:
A system for configuring and utilizing J electromagnetic radiation sources (J≧2) to serially irradiate a substrate. Each source has a different function of wavelength and angular distribution of emitted radiation. The substrate includes a base layer and I stacks (I≧2 J≦I) thereon. Pj denotes a normally incident energy flux on each stack from source j. In each of I independent exposure steps, the I stacks are concurrently exposed to radiation from the J sources. Vi and Si respectively denote an actual and target energy flux transmitted into the substrate via stack i in exposure step i (i=1, . . . , I). t(i) and Pt(i) are computed such that: Vi is maximal through deployment of source t(i) as compared with deployment of any other source for i=1, . . . , I and an error E being a function of V1−S1, V2−S2, . . . , VI−SI is about minimized with respect to Pi (i=1, . . . , I).
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中国工程科技知识中心
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