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Device and method for gas treatment using low-temperature plasma and catalyst medium
专利权人:
NBC Meshtec; Inc.
发明人:
Ikegami, Makoto,Matsumoto, Takanori,Nakayama, Tsuruo,Jikihara, Youhei
申请号:
AU2012311020
公开号:
AU2012311020A1
申请日:
2012.09.04
申请国别(地区):
AU
年份:
2014
代理人:
摘要:
[Problem] To provide a device and a method for oxidation decomposition treatment of a hazardous gas of a volatile organic compound (VOC) or the like at normal temperature. [Solution] A gas treatment device characterized in being provided with a plasma-generating unit and a catalyst medium. The plasma-generating unit is provided with at least a flow channel through which a gas to be treated flows; and a power-supply unit for supplying electrical power, a first electrode, a second electrode, and a dielectric material arranged inside the flow channel. A voltage is impressed between the first electrode and the second electrode by the power-supply unit and electrical discharging is caused to occur, whereby plasma is generated. The catalyst medium is adapted for accelerating a reaction with the gas to be treated and is provided in a position where the plasma generated by the plasma-generating unit inside the flow channel is present, wherein the catalyst medium has metallic catalytic particles present on an inorganic substance.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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