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System and method for analyzing wavefront aberrations
专利权人:
Andreas W. Dreher
发明人:
Andreas W. Dreher,Shui T. Lai
申请号:
US13099190
公开号:
US08388137B2
申请日:
2011.05.02
申请国别(地区):
US
年份:
2013
代理人:
摘要:
A method of creating a statistical model for use in predicting vision correction prescriptions for patients is disclosed. The method comprises obtaining a plurality of wavefront aberration measurements from a plurality of patients eyes, obtaining a plurality of visual acuity measurements from the plurality of patients, applying values associated with the plurality of wavefront measurements to an input layer of a statistical model, applying values associated with the plurality of visual acuity measurements to an output layer of the statistical model, and generating a plurality of weight values associated with respective nodes of the statistical model based on the applied values associated with the plurality of wavefront measurements and corresponding values associated with the plurality of visual acuity measurements.
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中国工程科技知识中心
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