THOMAS SEITZ,MATTHIAS WITSCHEL,JENS LERCHL,RAPHAEL APONTE,LILIANA PARRA RAPADO,HELMUT KRAUS,TREVOR WILLIAM NEWTON,KLAUS KREUZ,KLAUS GROSSMANN,RICHARD ROGER EVANS
申请号:
MX2014005175
公开号:
MX2014005175A
申请日:
2012.11.13
申请国别(地区):
MX
年份:
2014
代理人:
摘要:
The present invention relates to substituted 1,2,5-oxadiazole compounds of the formula I and the N-oxidesand salts thereof and to compositions comprising the same. The invention also relates to the use of the 1,2,5-oxadiazole compounds or of the compositions comprising such compounds for controlling unwanted vegetation. Furthermore,the invention relates to methods of applying such compounds. In formula I, the variables have the following meanigns R is e.g. hydrogen, cyano, nitro, halogen, C1-C6--alkyl, C3-C7-cycloalkyl, C3-C7- cycloalkyl-C1-C4-alkyl, C1-C6-haloalkyl, C2-C6-alkenyl, C2-C6-haloalkenyl, C2-C6-alkynyl,C2-C6 -haloalkynyl, C1-C4-alkoxy-C1-C4- alkyl,C1-C4-haloalkoxy-C1-C4-alkyl,O-Ra, Z-S(O)n-Rb, Z-C(=O)-Rc, Z-C(=O)-ORd, Z-C(=O)-NReRf, Z-NRgRh, Z-phenyl and Z-heterocyclyl etc R1 ise.g. Z1-cyano, halogen, nitro, C1-C8-alkyl, C2-C8-alkenyl, C2-C8-alkynyl,C1-C8 -haloalkyl, C1-C8-alkoxy, C1-C4-alkoxy-C1-C4-alkyl, Z1-C1-C4-alkoxy-C1- C4-alkoxy, C1-C4-alkylthio-C1-C4-alkyl, Z1-C1-C4-alkylthio-C1-C4-alkylthio, C2-C6-alkenyloxy, C2-C6-alkynyloxy, C1-C6-haloalkoxy, C1-C4-haloalkoxy-C1-C4-alkyl, Z1-C1-C4-haloalkoxy-C1-C4-alkoxy, Z1-S(O)k-R1b, Z1-phenoxy and Z1-heterocyclyloxyR2,R3 are identical or different and e.g. hydrogen, halogen, Z2-OH, Z2-NO2,Z2-cyano,C1- C6-alkyl, C2-C8-alkenyl, C2-C8-alkynyl, Z2-C3-C10-cycloalkyl, Z2-C3-C10-cycloalkoxy, C1-C8-haloalkyl, Z2-C1-C8-alkoxy, Z2-C1-C8-haloalkoxy, Z2-C1-C4-alkoxy-C1- C4-alkoxy, Z2-C1-C4-alkylthio-C1-C4-alkylthio, Z2-C2-C8-alkenyloxy, Z2-C2-C8-alkynyloxy, Z2-C1-C8-haloalkoxy, Z2-C2-C8-haloalkenyloxy, Z2-C2-C8-haloalkynyloxy, Z2-C1-C4- haloalkoxy-C1-C4-alkoxy, Z2-(tri-C1-C4-alkyl)silyl, Z2-S(O)k-R2b, Z2-C(=O)-R2c, Z2-C(=O)-OR2d, Z2-C(=O)-NR2eR2f, Z2-NR2gR2h, Z2a-phenyl and Z2a-heterocyclyl R4 is selected from the group consisting of hydrogen, halogen, cyano, nitro, C1-C4-alkyl and C1-C4-haloalkyl R5 is selected from the group consisting of hydrogen, halogen, C1-C4-alkyl and C1-