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Beam monitor system and particle beam irradiation system
专利权人:
发明人:
Yoshihito Hori,Takayoshi Matsushita,Kunio Moriyama,Masahiro Tadokoro
申请号:
US14548556
公开号:
US09162081B2
申请日:
2014.11.20
申请国别(地区):
US
年份:
2015
代理人:
摘要:
A beam monitor system having a simple configuration for improving a measurement precision specifying a position and the width. A beam monitor system, comprising collection electrodes that include a plurality of groups each having a plurality of adjacent wire electrodes, and detect an ionized particle beam passing therethrough, a first signal processing device that sets one wire electrode in the groups of the collection electrodes as a typical wire electrode, receives a detection signal output from the typical wire electrode to process the signal and a beam monitor controller that obtains a beam position of the ionized particle beam that has passed through the wire electrodes on the basis of a processed signal from the first signal processing device.
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