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HARMFUL SUBSTANCE TREATMENT METHOD AND OZONE GENERATING DEVICE
专利权人:
TAMURA TECO CO., LTD.;KINKI UNIVERSITY
发明人:
Kozo TAMURA,Shunji ISHIWATA,Tomomi INOUE,Takeshi KOTAKE
申请号:
US16755415
公开号:
US20200254123A1
申请日:
2018.10.10
申请国别(地区):
US
年份:
2020
代理人:
摘要:
A treatment method is capable of degrading or sterilizing harmful substances or microorganisms of which the degradation, detoxification, or the like is not easy for ozone gas alone. A harmful substance treatment method is one that makes ozone gas act on harmful substances, microorganisms, or the like in an environment humidified using a surfactant solution. The harmful substances include anticancer drugs. As a surfactant to be used, a non-ionic surfactant, an anionic surfactant, a cationic surfactant, or an amphoteric surfactant can be used.
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来源网址:
http://www.ckcest.cn/home/
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