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COMPOUND, COMPOSITION CONTAINING COMPOUND, AND PHOTODYNAMIC TREATMENT METHOD FOR INACTIVATING OR KILLING BACTERIA BY USING COMPOUND
专利权人:
EWHA UNIVERSITY - INDUSTRY COLLABORATION FOUNDATION;이화여자대학교 산학협력단
发明人:
YOON JU YOUNG,윤주영,LI XINGSHU,리 싱슈,LEE DA YOUNG,이다영
申请号:
KR1020180092055
公开号:
KR1020200016682A
申请日:
2018.08.07
申请国别(地区):
KR
年份:
2020
代理人:
摘要:
Disclosed are: a compound; a composition containing the compound; and a photodynamic treatment method for inactivating or killing bacterial using the compound. The compound represented by chemical formula 1 according to an aspect provides a photosensitizer compound. In addition, the composition containing the photosensitizer compound or pharmaceutically acceptable salt thereof can form a stable self-assembled nanodot structure.COPYRIGHT KIPO 2020화합물, 상기 화합물을 포함하는 조성물, 및 상기 화합물을 이용하여 박테리아 세균을 비활성화 또는 사멸시키는 광역학 치료방법을 개시한다.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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