The invention relates to a nail polish composition containing at least one film-forming agent, a plasticizer, and a solvent. Said composition is characterized in that it also includes one or more oligomer(s) having a molar mass of 1500 g/mol and/or a glass transition temperature Tg greater than 25° C. Said oligomer has dual acrylic or methacrylic bonds available for reacting with groups without containing any agent for cross-linking the oligomer, such as a photoinitiator. The method for applying the nail polish includes consecutively applying such a photoinitiator-free composition and a similar photoinitiator-containing composition followed by visible-light cross-linking. The nail polish has longer-lasting sheen and better hardness than solvent-based nail polishes and also comes on and off much more quickly than a gel-based nail polish.
