An electrolyte composition containing manganese and silicon in a plasma electrolytic oxidation process and a method for manufacturing dental implants coated by hydroxyapatite containing manganese and silicon ions using the composition
The present invention relates to a method for forming a porous surface containing calcium ions and phosphorus, which are components of bone, including manganese ions by using plasma oxidation method (Plasma Electrolytic Oxidation), which is anodic oxidation method, on a surface of a dental implant. More specifically, The surface of the porous oxide film containing manganese and silicon ions and calcium and phosphorus on the surface of the dental implants is removed by using an electrolytic solution containing manganese and silicon, The present invention relates to a method for manufacturing an implant that is formed by a plasma electrolytic oxidation method and improved in biological activity. The process comprises the steps of preparing a titanium alloy for sequentially polishing, fine polishing and ultrasonic cleaning the dental titanium alloy, And the anode is platinum, and then the cathode A plasma forming step of forming a plasma on the titanium alloy by applying a constant voltage and a current density to form an oxide film on the titanium alloy, and an oxidation film formed on the titanium alloy in the plasma forming step, followed by washing with ethanol and distilled water, Wherein the electrolyte composition comprises manganese and silicon in an electrolytic oxidation process including a drying step and a composition of the electrolyte composition and a composition thereof, wherein the composition is coated with apatite hydroxide containing manganese and silicon ions. The electrolytic composition containing manganese and silicon in the plasma electrolytic oxidation process and the effect of the method of manufacturing a dental implant coated with apatite containing manganese and silicon ions by using the composition are as follows: The surface of the dental implant is oxidized using the oxidation process. The manufacturing process is simple, and the implant preparation time and the treatment period are reduced. The plasma electrolytic oxidation method has
