PROBLEM TO BE SOLVED: To provide a cosmetic composition having excellent persistence of a water-soluble antidandruff agent after washing. A cosmetic composition containing an acid (B), a surfactant (C), a cationic copolymer (D), and a water-soluble antidandruff agent (E). Preferably, it is further derived from a structural unit derived from a vinyl-based monomer having a hydrophilic group represented by the following (Formula 1) and a vinyl-based monomer having a hydrophobic group represented by the following (Formula 2). It contains a vinyl-based copolymer (A) having a structural unit. CH2 = C (R1) -COO- (CH2) m-N + R2R3R4 (Formula 1) (R1 is a hydrogen atom or a methyl group, R2 and R3 are independently hydrogen atoms or alkyl groups having 1 to 4 carbon atoms, and R4 is CH2COO. -Or O- group. M is 1 to 4.) CH2 = C (R5) -COOR6 (Formula 2) (R5 is a hydrogen atom or a methyl group, R6 is a linear, branched or cyclic with 1 to 40 carbon atoms. Alkyl group or aromatic group.) [Selection diagram] Fig. 2【課題】洗浄後の水溶性抗フケ剤の残留性に優れた化粧料組成物を提供する。【解決手段】酸（Ｂ）と、界面活性剤（Ｃ）と、カチオン性共重合体（Ｄ）と、水溶性抗フケ剤（Ｅ）とを含有する化粧料用組成物。好ましくは更に、下記（式１）で表される親水性基を有するビニル系単量体由来の構造単位と、下記（式２）で表される疎水性基を有するビニル系単量体由来の構造単位とを有するビニル系共重合体（Ａ）を含有する。 ＣＨ２＝Ｃ（Ｒ１）－ＣＯＯ－（ＣＨ２）ｍ－Ｎ＋Ｒ２Ｒ３Ｒ４ （式１）（Ｒ１は水素原子又はメチル基、Ｒ２，Ｒ３は各々独立に水素原子又は炭素数１～４のアルキル基、Ｒ４はＣＨ２ＣＯＯ－又はＯ－基。ｍは１～４。） ＣＨ２＝Ｃ（Ｒ５）－ＣＯＯＲ６ （式２）（Ｒ５は水素原子又はメチル基、Ｒ６は炭素数１～４０の、直鎖、分岐もしくは環状のアルキル基又は芳香族基。）【選択図】図２
