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专利权人:
澁谷工業株式会社
发明人:
西納 幸伸,西 富久雄,山本 幸宏
申请号:
JP2007299629
公开号:
JP5186892B2
申请日:
2007.11.19
申请国别(地区):
JP
年份:
2013
代理人:
摘要:

PROBLEM TO BE SOLVED: To reduce an area where a gripper interrupts an electron beam to the extent possible when a bottle is irradiated with the electron beam in such a state that the gripper holds the bottle.

SOLUTION: This gripper includes a pair of grip members 10B and the other positioned on both sides of the bottle 4 and a pair of upper and lower protruded parts 22 provided on each of the grip members and arranged at front and rear two points (protruded parts of one of the grip members and protruded parts of the other grip members 22Ba, 22Bb, 22Bc, 22Bd). A neck part 4a of the bottle 4 is clamped and held from both sides by these protruded parts. Opening parts 10Bd and others passing through inside and outside are provided on the grip members. It is possible to irradiate the electron beam on the neck part from clearances 24Ba, 24Bb and others on the upper and lower protruded parts and the opening parts in the state of holding the bottle 4. Additionally, a small projection is provided on an upper surface of the grip member so as not to make contact with the whole of a lower surface of a flange 4c.

COPYRIGHT: (C)2009,JPO&INPIT

来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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