Process and material solution to reduce metal ion release for implantable medical device application
- 专利权人:
- Alan Shi
- 发明人:
- Alan Shi,Bernard Li
- 申请号：
- US13447873
- 公开号：
- US09284648B2
- 申请日:
- 2012.04.16
- 申请国别(地区):
- US
- 年份:
- 2016
- 代理人:
- 摘要：
- The invention describes a method and compositions where the presence of cobalt and or nickel have been depleted from the surface layer(s) of a cobalt, chromium, nickel containing alloy.
- 来源网站：
- 中国工程科技知识中心
