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MICRONEEDLE ARRAY AND MANUFACTURING METHOD OF SAME
专利权人:
FUJIFILM Corporation
发明人:
Kenichiro TAMAKI
申请号:
US16777902
公开号:
US20200246602A1
申请日:
2020.01.31
申请国别(地区):
US
年份:
2020
代理人:
摘要:
Provided are a microneedle array capable of improving the visibility of an appearance inspection, and a manufacturing method of the same.A microneedle array is a microneedle array including: a sheet portion having a first surface and a second surface which oppose each other; and a plurality of needle portions arranged on the first surface of the sheet portion, in which the second surface of the sheet portion is configured by a rough surface having peak portions and valley portions, and an average transmittance of the sheet portion in a wavelength range of 300 nm to 740 nm is 75% or less.
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中国工程科技知识中心
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