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TECHNIQUE FOR PHOTODISRUPTIVE MULTI-PULSE TREATMENT OF A MATERIAL
专利权人:
WaveLight GmbH
发明人:
VOGLER KLAUS,VOGLER KLAUS,DONITZKY CHRISTOF,DONITZKY CHRISTOF
申请号:
PL14721882
公开号:
PL2953596T3
申请日:
2014.05.07
申请国别(地区):
PL
年份:
2017
代理人:
摘要:
Embodiments of the invention provide a method and apparatus for laser-processing a material. In the embodiments, a diffraction-limited beam of pulsed laser radiation is diffracted by a diffraction device to generate a diffracted beam. The diffracted beam is subsequently focused onto the material and is controlled in time and space to irradiate the material at a target position with radiation from a set of radiation pulses of the diffracted beam so that each radiation pulse from the set of radiation pulses is incident at the target position with a cross-sectional portion of the diffracted beam, the cross-sectional portion including a local intensity maximum of the diffracted beam. The beam cross-sectional portions of at least a subset of the pulses of the set include each a different local intensity maximum. In this way, a multi-pulse application for generating a photo-disruption at a target location of the material can be implemented.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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