Method of low temperature imprinting process with high pattern transfer yield

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专利权人:

Yongan Xu

发明人:

Yongan Xu,Hong Yee Low

申请号：

US13017976

公开号：

US08298467B2

申请日:

2011.01.31

申请国别(地区):

US

年份:

2012

代理人:

摘要：

The present invention is directed to novel methods of imprinting substrate-supported or freestanding structures at low cost, with high pattern transfer yield, and using low processing temperature. Such methods overcome many of the above-described limitations of the prior art. Generally, such methods of the present invention employ a sacrificial layer of film.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/