COLLOIDAL SOLUTION, SILICA NANOSHEET NETWORK STRUCTURE-COVERED BASE MATERIAL, BASE MATERIAL FOR GENE TRANSFECTION, AND METHOD FOR PRODUCING THE COLLOIDAL SOLUTION

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专利权人:

国立研究開発法人物質・材料研究機構

发明人:

吉 慶敏,山崎 智彦,有賀 克彦,花方 信孝

申请号：

JP2014256239

公开号：

JP6425340B2

申请日:

2014.12.18

申请国别(地区):

JP

年份:

2018

代理人:

摘要：

PROBLEM TO BE SOLVED: To provide a silica nanosheet network structure-covered base material usable to treatment of taking a gene to a cell, namely, to a transfection, further, a colloidal solution usable for creating the base material, and a method for producing the same.SOLUTION: Provided is a colloidal solution dispersed with a silica nanosheet network structure connected with a vertical silica nanosheet in a network structure to a horizontal direction, a method for producing the same, and a silica nanosheet network structure-covered base material produced by applying the colloidal solution to the surface of a base material.SELECTED DRAWING: Figure 2

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