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GUIDE PARALLÈLE POUR IMPLANTS CHIRURGICAUX
专利权人:
Sicage; LLC
发明人:
申请号:
EP18811972.1
公开号:
EP3703595A1
申请日:
2018.10.31
申请国别(地区):
EP
年份:
2020
代理人:
摘要:
Disclosed herein is a parallel spacer for parallel spacing of a guide wire/pin during surgery. The parallel spacer includes a parallel spacer body having a top surface and a bottom surface. The parallel spacer also includes a first aperture extending through the body and defined by one or more internal walls that extends to the opening in the top surface. The aperture is sized to receive a first guide and hold the first guide in a first orientation. A second aperture extends between a second opening in the top surface and a second opening in the bottom surface. The second aperture is defined by one or more walls located within the spacer body. The one or more walls connect the second opening in the top surface to the second opening in the bottom surface. The aperture is sized to receive another guide and hold the other guide in a parallel orientation to the first orientation at a first distance from the first aperture. A third aperture extends between a third opening in the top surface and a third opening in the bottom surface. The third aperture is defined by one or more walls located within the spacer body. The one or more walls connect the third opening in the top surface to the third opening in the bottom surface. The aperture is sized to receive another guide and hold the other guide in a parallel orientation to the first orientation at a second distance from the first aperture. The parallel spacer also includes at least two spacer markings. A first spacer marking is positioned adjacent to the second aperture and a second spacer marking is positioned adjacent to the third aperture. Each of the two spacer markings mark the first distance and the second distance.L'invention concerne un élément d'espacement parallèle permettant d'espacer un fil/une broche de guidage pendant une opération chirurgicale. L'élément d'espacement comprend un corps comportant des surfaces supérieure et inférieure. L'élément d'espacement comprend une première ouverture s'étendant à traver
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中国工程科技知识中心
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