Disclosed is a cleansing composition containing from about 6% to about 20% of at least one nonionic surfactant from about 3% to about 10% of at least one amphoteric surfactant from about 2% to about 8% of at least one anionic surfactant and from about 0.1% to about 5% of at least one cationic conditioning surfactant, cationic conditioning amine, or a mixture thereof wherein the amount of nonionic surfactant present in the final composition is greater than the amount of the amphoteric surfactant, and the ratio of the nonionic surfactant (a) to anionic surfactant (c) is at least about 1.9 as much as the anionic surfactant, based on the weight percent of each surfactant in the final composition.
