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超音波探触子の製造方法および超音波探触子
专利权人:
株式会社日立メディコ
发明人:
小林 孝,町田 俊太郎
申请号:
JP2010546607
公开号:
JP5286369B2
申请日:
2010.01.06
申请国别(地区):
JP
年份:
2013
代理人:
摘要:
The manufacturing yield of semiconductor devices (CMUTs) is improved. Before a polyimide film serving as a protective film is formed, a membrane is repeatedly vibrated to evaluate the breakdown voltage between an upper electrode and a lower electrode, and the upper electrode of a defective CMUT cell whose breakdown voltage between the upper electrode and the lower electrode is reduced due to the repeated vibrations of the membrane is removed in advance to cut off the electrical connection with other normal CMUT cells. By this means, in a block RB or a channel RCH including the recovered CMUT cell RC, reduction in the breakdown voltage between the upper electrode and the lower electrode after the repeated vibrations of the membrane is prevented.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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