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Quinoline as antibacterial agent
专利权人:
Janssen Pharmaceutica NV
发明人:
Backx, Leo Jacobus Jozef,Meerpoel, Lieven,Guillemont, Jérôme Emile Georges,Lancois, David Francis Alain,Andries, Koenraad Jozef Lodewijk Marcel,Koul, Anil,Motte, Magali Madeleine Simone,Dorange, Ismet
申请号:
NO20080501
公开号:
NO342701B1
申请日:
2008.01.28
申请国别(地区):
NO
年份:
2018
代理人:
摘要:
Compound is used to manufacture the drug for the treatment of bacterium infection, as long as bacterium infection is not mycobacterial infections, the compound be formula (I) compound (pound) or its it is pharmaceutically acceptable acid or base addition salts, a kind of spatial chemistry it is isomeric from, its tautomer, itself or from a N- oxide: wherein R1 is hydrogen, halogeno-group, halogenated alkyl, cyano, hydroxyl, Ar, heterozygous phage, alkyl, alkoxy, alkylthio group, alkoxyalkyl, alkylthio alkyl, aralkyl or two (argon gas) alkyl; P is 1,2,3 or 4; R2 is hydrogen, hydroxyl, sulfydryl, alkoxy, alkyloxy-alkoxy, alkylthio group, list or two (alkyl) amidos or general formula group; R3 is alkyl, Ar, aralkyl or alkyl; Heterozygous phage heterozygous phage q is 1,2 or 3; R4 and R5 is hydrogen, alkyl or benzyl; Or R4 is together with R5, including N it is in connection can form ring; R6 is hydrogen, halogeno-group, halogenated alkyl, hydroxyl, hydroxyl, Ar, alkyl, alkoxy, alkylthio group, alkoxyalkyl, alkylthio alkyl, aralkyl or two (argon gas) alkyl; Or two adjacent R6 groups can be formed together bivalent group formula-CH=CH-CH=CH-; R is 1,2,3,4 or 5; R7 is hydrogen, alkyl, Ar or heterozygous phage; R8 is hydrogen or alkyl; R9 oxos; Or R8 and R9 be collectively formed group-CH=CH-N=.Anvendelse av en forbindelse for fremstilling av et medikament for behandling av en bakteriell infeksjon, forutsatt at den bakterielle infeksjon er noe annet enn en mykobakteriell infeksjon, hvor nevnte forbindelse er en forbindelse med formel (Ia) eller (Ib) et farmasøytisk akseptabelt syre- eller baseaddisjonssalt derav, en stereokjemisk isomer form derav, en tautomer form derav eller en N-oksidform derav, hvori R1 er hydrogen, halogen, halogenalkyl, cyano, hydroksy, Ar, Het, alkyl, alkyloksy, alkyltio, alkyloksyalkyl, alkyltioalkyl, Ar-alkyl eller di(Ar)alkyl; p er 1, 2, 3 eller 4; R2 er hydrogen, hydroksy, merkapto, alkyloksy, alkyloksyalkyloksy, alkyltio, mono- eller di(alkyl)a
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