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PLASMA TREATMENT SYSTEM
专利权人:
Olympus Corporation
发明人:
ISHIKAWA, Manabu,KIMURA, Shuichi,WATANABE, Koichiro
申请号:
EP15776131
公开号:
EP3130301A4
申请日:
2015.03.27
申请国别(地区):
EP
年份:
2017
代理人:
摘要:
In a plasma treatment system, a temperature detection section detecting a temperature of a perfusion layer of an electrically conductive solution is fixed to a treatment portion, and is located at a position to be immersed in the perfusion layer when a first electrode portion and a second electrode portion are immersed in the perfusion layer. In the plasma treatment system, a control section controls an adjustment of a temperature in a temperature adjustment unit and controls a supply volume and a suction volume of the electrically conductive solution on the basis of a detection result in the temperature detection section so that the temperature of the perfusion layer is within a target temperature range.
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