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Via and trench filling using injection molded soldering
专利权人:
International Business Machines Corporation
发明人:
John U. Knickerbocker,Shriya Kumar,Jae-Woong Nah
申请号:
US15610885
公开号:
US10383572B2
申请日:
2017.06.01
申请国别(地区):
US
年份:
2019
代理人:
摘要:
A method includes forming one or more vias in a substrate, forming a first photoresist layer on a top surface of the substrate and a second photoresist layer on a bottom surface of the substrate, patterning the first photoresist layer and the second photoresist layer to remove at least a first portion of the first photoresist layer and at least a second portion of the second photoresist layer, filling the one or more vias, the first portion and the second portion with solder material using injection molded soldering, and removing remaining portions of the first photoresist layer and the second photoresist layer.
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