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ORBITAL WALL IMPLANT MANUFACTURING METHOD AND ORBITAL WALL IMPLANT
专利权人:
가톨릭관동대학교산학협력단
发明人:
이훈범
申请号:
KR1020170023539
公开号:
KR1019229660000B1
申请日:
2017.02.22
申请国别(地区):
KR
年份:
2018
代理人:
摘要:
The present invention relates to an orbital wall implant manufacturing method and, more specifically, to an orbital wall implant manufacturing method allowing thread to pass through a sheet and be running-stitched so as to form a mesh structure. The orbital wall implant manufacturing method, which replaces a damaged orbital floor or medial orbital wall, comprises the steps of: forming, by thread made of a polyolefin-based material, one or more first running stitches, which comprises a plurality of steeks, on a planar sheet made of a biodegradable material and forming, by thread, one or more second running stitches, which comprise a plurality of steeks, so as to be crossed with the first running stitches, wherein the first running stitches and the second running stitches are formed so as to pass through the sheet, cross each other so as to form a mesh structure, and provide rigidity to the sheet.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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