WANG, MING CHEN,王明诚,王明誠,CHEN, ZUN LU,陈遵禄,陳遵祿,蔡尚斌,蔡尚斌,LI, YAN SYUN,李彦勳,李彥勳
申请号：
TW105143605
公开号：
TWI612981B
申请日:
2016.12.28
申请国别(地区):
TW
年份:
2018
代理人:
摘要：
A plasma sterilization system comprises a power supply a high voltage amplifying coil which is used for voltage modulation of the power supply and is disposed between a plurality of electrodes and the power supply a plasma reactor comprising a plurality of electrodes electrically connected with the power supply an insulation layer covering one side of the plurality of electrodes to prevent the generation of arc discharge and a dielectric layer disposed on the other side of the plurality of electrodes. The plurality of electrodes may form an electric field through the power supply to generate plasma. The plasma is generated above the dielectric layer, wherein the thickness of the plasma reactor lies between 0.09 mm and 2.5 mm.一種滅菌電漿系統,其包括一電源供應器;一高壓放大線圈,該高壓放大線圈係用以將電源供應器之電壓調變,設置於該複數個電極與該電源供應器之間;一電漿反應器,該電漿反應器包含有複數個電極,該複數個電極與電源供應器電性連結;一絕緣層,該介電層係包覆該複數個電極之一測,以避免產生電弧放電;及一介電層,該介電層係設置於該複數個電極之另一側,該複數個電極可透過該電源供應器形成電場以產生一電漿,該電漿係產生於該介電層之上;其中,該電漿反應器之厚度介於0.09毫米至2.5毫米之間。7‧‧‧高壓放大線圈9‧‧‧電漿31‧‧‧電極33‧‧‧介電層35‧‧‧絕緣層311‧‧‧正電極312‧‧‧負電極
