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IMPLANT AND METHOD OF PRODUCTION THEREOF
专利权人:
DOT GmbH
发明人:
Axel BAUMANN,Henry DEMPWOLF,Marcus KRAWUTSCHKE
申请号:
US16567764
公开号:
US20200101193A1
申请日:
2019.09.11
申请国别(地区):
US
年份:
2020
代理人:
摘要:
An implant for insertion into a human or animal body including at least a substrate made of a metallic material and a surface formed on the substrate. The surface is completely or partially provided with a hard material coating. The hard material coating has a basic layer of TiN or TiNbN applied by means of a PVD method and an outer layer of TiAlN applied onto the basic layer by means of a PVD method. A method of production of the implant by using a PVD method.
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